In this paper, reliability issues in Gallium Nitride (GaN) HEMTs are empirically investigated. To this purpose, stress measurements were carried out on a microwave transistor under realistic load-line conditions exploiting a nonlinear load-pull setup operating at few megahertz. Although the characterization strategy was applied on a 150-nm GaN technology, it has general validity and, as will be demonstrated by the reported experimental results, can be successfully applied to evaluate the maturity of the investigated technology processes.
Raffo, A., Vadalà, V., Bosi, G., Giofre, R., Vannini, G. (2022). 150-nm GaN HEMT Degradation under Realistic Load-Line Operation. In 2022 17th European Microwave Integrated Circuits Conference, EuMIC 2022 (pp.141-144). Institute of Electrical and Electronics Engineers Inc. [10.23919/EuMIC54520.2022.9923438].
150-nm GaN HEMT Degradation under Realistic Load-Line Operation
Vadalà V.;Bosi G.;
2022
Abstract
In this paper, reliability issues in Gallium Nitride (GaN) HEMTs are empirically investigated. To this purpose, stress measurements were carried out on a microwave transistor under realistic load-line conditions exploiting a nonlinear load-pull setup operating at few megahertz. Although the characterization strategy was applied on a 150-nm GaN technology, it has general validity and, as will be demonstrated by the reported experimental results, can be successfully applied to evaluate the maturity of the investigated technology processes.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.