This work reports the morphological and chemical characterization of multiferroic BiFeO3 polycrystalline thin films grown on Si(111) by RF-sputtering. Results are shown for a large set of samples and a wide array of experimental techniques, including imaging (atomic/piezoresponse force microscopy) and spectroscopic (μ-Raman, X-ray photoemission, X-ray diffraction) probes. Through growth and post-growth annealing treatment, a fine control over stoichiometry, grain size, grain orientation, crystal order and surface roughness is achieved. In particular, the grain size can be tailored from nanocrystals to large micrometric plates as a function of the annealing temperature. For the optimal stoichiometric sample, an additional X-ray absorption and magnetic circular dichroism analysis has been carried out, which provides high quality spectra comparable with epitaxial films and further proves the expected strong local antiferromagnetic order.

Drera, G., Giampietri, A., Alessandri, I., Magnano, E., Bondino, F., Nappini, S. (2015). Grain size and stoichiometry control over RF-sputtered multiferroic BiFeO3 thin films on silicon substrates. THIN SOLID FILMS, 589, 551-555 [10.1016/j.tsf.2015.06.030].

Grain size and stoichiometry control over RF-sputtered multiferroic BiFeO3 thin films on silicon substrates

Drera G
;
2015

Abstract

This work reports the morphological and chemical characterization of multiferroic BiFeO3 polycrystalline thin films grown on Si(111) by RF-sputtering. Results are shown for a large set of samples and a wide array of experimental techniques, including imaging (atomic/piezoresponse force microscopy) and spectroscopic (μ-Raman, X-ray photoemission, X-ray diffraction) probes. Through growth and post-growth annealing treatment, a fine control over stoichiometry, grain size, grain orientation, crystal order and surface roughness is achieved. In particular, the grain size can be tailored from nanocrystals to large micrometric plates as a function of the annealing temperature. For the optimal stoichiometric sample, an additional X-ray absorption and magnetic circular dichroism analysis has been carried out, which provides high quality spectra comparable with epitaxial films and further proves the expected strong local antiferromagnetic order.
Articolo in rivista - Articolo scientifico
BiFeO3; Growth characterization; Multiferroic materials; RF-sputtering
English
2015
589
551
555
none
Drera, G., Giampietri, A., Alessandri, I., Magnano, E., Bondino, F., Nappini, S. (2015). Grain size and stoichiometry control over RF-sputtered multiferroic BiFeO3 thin films on silicon substrates. THIN SOLID FILMS, 589, 551-555 [10.1016/j.tsf.2015.06.030].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/517501
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