We analyze the structural, vibrational, and elastic properties of epitaxial novel FeSi films on Si(111) in the CsCl structure by Rutherford-backscattering spectrometry, x-ray-diffraction, infrared transmittance/ reflectance, and Brillouin-light-scattering measurements. By comparing our results for different film thicknesses and by interpreting them on the basis of semiempirical total-energy calculations, we are able to relate the changes in vibrational properties with the progressive strain relaxation as a function of sample thickness. For the thickest film (890) we obtain indications that a structural transition to the (bulk) ε phase is about to take place. © 1994 The American Physical Society.
Vonkanel, H., Mendik, M., Mader, K., Onda, N., Goncalvesconto, S., Schwarz, C., et al. (1994). Elastic and vibrational properties of pseudomorphic fesi films. PHYSICAL REVIEW. B, CONDENSED MATTER, 50(6), 3570-3576 [10.1103/PhysRevB.50.3570].
Elastic and vibrational properties of pseudomorphic fesi films
MIGLIO, LEONIDA;
1994
Abstract
We analyze the structural, vibrational, and elastic properties of epitaxial novel FeSi films on Si(111) in the CsCl structure by Rutherford-backscattering spectrometry, x-ray-diffraction, infrared transmittance/ reflectance, and Brillouin-light-scattering measurements. By comparing our results for different film thicknesses and by interpreting them on the basis of semiempirical total-energy calculations, we are able to relate the changes in vibrational properties with the progressive strain relaxation as a function of sample thickness. For the thickest film (890) we obtain indications that a structural transition to the (bulk) ε phase is about to take place. © 1994 The American Physical Society.
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