The results of a systematic photo and cathodo-luminescence analysis of a large matrix of CZ silicon samples on which different nucleation and oxide precipitation anneals have been carried out, are reported and correlated with the results of infrared and TEM analysis on the same sets of samples. The results obtained show that the precipitates are correlated with centres, which are responsible of light emission at 0.8 eV and 0.87 eV. Analysis on intentionally dislocated CZ and FZ samples supported these results and confirm that D3 and D4 bands are intrinsic to dislocations.

Pizzini, S., Binetti, S., LE DONNE, A., Leoni, E., Acciarri, M., Salviati, G., et al. (2001). Beam injection studies of dislocations and oxygen precipitates in semiconductor silicon. DIFFUSION AND DEFECT DATA, SOLID STATE DATA. PART B, SOLID STATE PHENOMENA, 78-79, 57-64 [10.4028/www.scientific.net/SSP.78-79.57].

Beam injection studies of dislocations and oxygen precipitates in semiconductor silicon

Pizzini, S;BINETTI, SIMONA OLGA;LE DONNE, ALESSIA;ACCIARRI, MAURIZIO FILIPPO;
2001

Abstract

The results of a systematic photo and cathodo-luminescence analysis of a large matrix of CZ silicon samples on which different nucleation and oxide precipitation anneals have been carried out, are reported and correlated with the results of infrared and TEM analysis on the same sets of samples. The results obtained show that the precipitates are correlated with centres, which are responsible of light emission at 0.8 eV and 0.87 eV. Analysis on intentionally dislocated CZ and FZ samples supported these results and confirm that D3 and D4 bands are intrinsic to dislocations.
Articolo in rivista - Articolo scientifico
Annealing; Cathodoluminescence; Dislocations (crystals); Light emission; Nucleation; Oxygen; Photoluminescence; Precipitation (chemical); Transmission electron microscopy, Beam injection; Oxygen precipitates, Semiconducting silicon
English
2001
78-79
57
64
none
Pizzini, S., Binetti, S., LE DONNE, A., Leoni, E., Acciarri, M., Salviati, G., et al. (2001). Beam injection studies of dislocations and oxygen precipitates in semiconductor silicon. DIFFUSION AND DEFECT DATA, SOLID STATE DATA. PART B, SOLID STATE PHENOMENA, 78-79, 57-64 [10.4028/www.scientific.net/SSP.78-79.57].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/23859
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