The SF6 plasma produced in a RF discharge device for surface treatment was studied by means of Langmuir probes. The relevant plasma parameters are extracted from the probe characteristics and the data are compared with the prediction of a numerical simulation of the reactor kinetics. As a results some insight on the relevant diffusion rate in such an electronegative plasma and on the interplay between recombination and diffusion processes is reached.
Riccardi, C., Barni, R., De Colle, F., Fontanesi, M. (1999). Analysis of the diffusion with negative ions in a SF6 plasma. JOURNAL OF TECHNICAL PHYSICS, 40(1), 221-224.
Analysis of the diffusion with negative ions in a SF6 plasma
RICCARDI, CLAUDIA;BARNI, RUGGERO;FONTANESI, MARCELLO
1999
Abstract
The SF6 plasma produced in a RF discharge device for surface treatment was studied by means of Langmuir probes. The relevant plasma parameters are extracted from the probe characteristics and the data are compared with the prediction of a numerical simulation of the reactor kinetics. As a results some insight on the relevant diffusion rate in such an electronegative plasma and on the interplay between recombination and diffusion processes is reached.
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