Organic photovoltaic devices (OPVs) are rapidly approaching the commercialization threshold thanks to continuous advances in conversion efficiencies and device durability. Even though the design of high performing active dyes (polymeric and molecular) has dominated the literature, the formulation of strategies improving stability and processability is at least as important as the achievement of record efficiencies. This paper proposes the use of functional photoresists based on acrylic end-capped squaraines as the photoactive layer of OPV devices. Our results show that the post-deposition photopolymerization process leads to insoluble photoactive layers that retain sizeable power conversion efficiencies, improved with respect to those of the parent unexposed materials.
Turrisi, R., Mascheroni, L., Sassi, M., Rooney, M., Buccheri, N., Ruffo, R., et al. (2016). Synthesis and Characterization of Squaraine-Based Photocrosslinkable Resists for Bulk Heterojunction Solar Cells. EUROPEAN JOURNAL OF ORGANIC CHEMISTRY, 2016(23), 4032-4040 [10.1002/ejoc.201600552].
Synthesis and Characterization of Squaraine-Based Photocrosslinkable Resists for Bulk Heterojunction Solar Cells
TURRISI, RICCARDOPrimo
;MASCHERONI, LUCASecondo
;SASSI, MAURO;Rooney, M;BUCCHERI, NUNZIO FRANCESCO;RUFFO, RICCARDO;BEVERINA, LUCA
2016
Abstract
Organic photovoltaic devices (OPVs) are rapidly approaching the commercialization threshold thanks to continuous advances in conversion efficiencies and device durability. Even though the design of high performing active dyes (polymeric and molecular) has dominated the literature, the formulation of strategies improving stability and processability is at least as important as the achievement of record efficiencies. This paper proposes the use of functional photoresists based on acrylic end-capped squaraines as the photoactive layer of OPV devices. Our results show that the post-deposition photopolymerization process leads to insoluble photoactive layers that retain sizeable power conversion efficiencies, improved with respect to those of the parent unexposed materials.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.